# | Title | Type | Language | |||||||||||
1. | Picosun Atomic Layer Deposition Marvell Nanofabrication Laboratory University of California Berkeley 1 0 2 0 3 0 4 0 Nanolab Equipment Manual Chapter 6 24 Picosun Atomic Layer Deposition ALD picosun 586 Equipment Purpose 1 1 Picosun ALD is a microprocessor controlled system that can atomically deposit a thin layer of metal oxides pure metals and with an additional ammonia gas source not connected at this time should be able to deposit metal nitrides Metal oxide films gro |
PDF Manual | ENGLISH | |||||||||||
# | Title | Type | Language | Download | ||||||||||
1. | Picosun Atomic Layer Deposition Marvell Nanofabrication Laboratory University of California Berkeley 1 0 2 0 3 0 4 0 Nanolab Equipment Manual Chapter 6 24 Picosun Atomic Layer Deposition ALD picosun 586 Equipment Purpose 1 1 Picosun ALD is a microprocessor controlled system that can atomically deposit a thin layer of metal oxides pure metals and with an additional ammonia gas source not connected at this time should be able to deposit metal nitrides Metal oxide films gro |
PDF Manual | ENGLISH |
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